21st Workshop Beams & More
28.11.2024
IMS CHIPS Stuttgart, Germany
Welcome to our Beams & More workshop!
We are delighted to be organising the 21st workshop after the first one in 2003. As in previous years, our partners and customers will be sharing their insights and experiences in presentations at the heart of the event.
You are cordially invited to attend the workshop, where you will have the opportunity to engage in a mutually beneficial exchange and enjoy the inspiring atmosphere of this one-day event.
The participation fee of € 280 includes lunch and dinner. An online link will be made available to all registrants, so that the presentations can be followed in case attendance at the workshop is not possible.
Please register by using the „Registration“ button on this website.
I am looking forward to meeting you in person at the workshop.
Sincerely,
Julian Hartbaum
Program
09:30 (00:05)
Jens Anders
IMS CHIPS
Stuttgart, Germany
Welcome
09:50 (00:20)
ASML
Veldhoven, The Netherlands
The next step in Moore’s Law: High NA EUV is here
10:10 (00:20)
Carl Zeiss SMT GmbH
Oberkochen, Germany
High-NA EUV – breakthrough in resolution and precision
10:30 (00:20)
IMS-Produkte GmbH
Stuttgart, Germany
IMS GmbH - Strengthening the IMS industry business over the next years
11:20 (00:20)
Astrit Shoshi
IMS CHIPS
Stuttgart, Germany
Mastering the master
11:40 (00:20)
EV Group
St. Florian am Inn, Austria
Synchronization of Process and Material to Achieve Best Results in Nanoimprinting Lithography
12:00 (00:20)
AIT
Vienna, Austria
Nanoimprint lithography for the fabrication of multifunctional nanoparticles for biomedical applications
12:20 (00:20)
IMS Nanofabrication GmbH
Brunn am Gebirge, Austria
Multi-Beam Mask Writers in the high-NA EUV era
14:50 (00:20)
Vistec Electron Beam GmbH
Jena, Germany
How can Variable Shaped Beam lithography be tuned for photonic and optics applications?
15:10 (00:20)
micro resist technology GmbH
Berlin, Germany
Innovative Photopolymers Advancing Micro- and Nano Patterning for Photonic Applications
15:30 (00:20)
Fraunhofer IOF
Jena, Germany
Advancements in nano-photonics: From PICs to waveguides to spectrometer gratings
16:20 (00:20)
Q.ANT GmbH
Stuttgart, Germany
Quantum sensors for native human machine interfaces
16:40 (00:20)
Fraunhofer ENAS
Chemnitz, Germany
2.5D grayscale and intra level mix and match lithography by electron beam and i-line stepper lithography processes
17:00 (00:20)
Bruker
Karlsruhe, Germany
Multi Modal Optical Metrology for High Resolution Refractive Index and Film Thickness Measurements