Partner for Advanced Nanopatterning
20th Workshop Beams & More
16.11.2023
IMS CHIPS
Stuttgart, Germany
Welcome to our
20th Beams & More workshop!
We are very pleased to be returning to a real on-site workshop, as was the case in 2019 and before, and it is my sincere pleasure to cordially invite you.
This workshop is not only a series of interesting contributions from our collaborating partners on micro- and nanopatterning techniques. It also offers the best networking opportunities by bringing together experts and decision makers from start-ups, SMEs and large companies.
The participation fee of € 270 includes lunch and dinner. An online link will be made available to all registrants, so that the presentations can be followed in case attendance at the workshop is not possible. Please note that the online stream allows only a limited participation and that a trouble-free operation cannot be guaranteed.
Please register by using the „Registration“ button on this website.
I am looking forward to meeting you in person at the workshop.
Sincerely,
Julian Hartbaum
Registration
Our maximum number of participants for the workshop has been reached, so unfortunately the registration for the workshop was closed earlier.
program
09:50 (00:20)
Victor Brasch
Q.ANT GmbH,
Stuttgart, Germany
E-beam lithography for integrated quantum optics with lithium niobate on insulator
11:20 (00:30)
Vistec Electron Beam GmbH
Jena, Germany
IMS CHIPS
Stuttgart, Germany
E-beam lithography optimization for high quality photonic waveguides
11:50 (00:20)
Uwe Zeitner
Fraunhofer IOF
Jena, Germany
The potential of e-beam lithography for micro- and nano-optics fabrication on large areas
12:10 (00:20)
CEA-Leti
Grenoble, France
Ebeam Direct Write Lithography: the versatile ally of optical lithography
12:30 (00:20)
Mustapha Chouiki
IMS Nanofabrication GmbH
Brunn am Gebirge, Austria
MBMW-301 and MBMW-100 Flex, the latest revolution in multi-beam mask writing
14:20 (00:20)
micro resist technology GmbH
Berlin, Germany
Update on photoresists and NIL polymers for advanced micro- and nanopatterning techniques
14:40 (00:20)
Patrick Schuster
EV Group,
St. Florian am Inn, Austria
Nanoimprint Lithography for Multilevel Structure Fabrication
15:00 (00:20)
SCIL Nanoimprint Solutions
Eindhoven, The Netherlands
Wafer based NIL for direct replication of inorganic functional optical materials
15:20 (00:20)
Stefan Schrittwieser
AIT Austrian Institute of Technology GmbH
Vienna, Austia
Nanoimprint lithography for the fabrication of multifunctional nanoparticles for biomedical applications
16:10 (00:20)
Carl Zeiss SMT GmbH
Oberkochen, Germany
High-NA EUV – the future that is already here
16:30 (00:20)
Dioptic GmbH
Weinheim, Germany
Computer Generated Holograms with continuous phase relief structure for beam shaping of Excimerlasers for medical applications
16:50 (00:20)
Sven Bauerdick
GenISys GmbH,
Taufkirchen, Germany
SEM-based metrology for micro and nano patterns