Dear colleagues,

I am honored to continue the “Beams & More” workshop initiated by Mathias Irmscher and it is a special pleasure for me to cordially invite you.

This one-day event is not only a well-established information platform on micro and nano patterning techniques and corresponding applications. It also provides best networking options by exploring new business opportunities enabled using technologies from IMS and partners.

I am proudly announcing 15 contributions from our collaborating partners as well as two IMS presentations on the following topics:
• Progress in EUV lithography
• Nanoimprint Lithography
• Laser-structuring
• Metrology
• Silicon Photonics
• Micro Optics

We recently updated our infrastructure significantly. Our wet benches were upgraded to latest standards. A new coater and developer for masks and wafers was installed and has been qualified.

Our highlight is a new key tool for MEMS, master and photonic devices, a wafer etch cluster equipped with four chambers. The different chambers are designed for wafer sizes up to 200 mm and include metal etching, cryogenic silicon etching and the Bosch process. Installation is underway and we expect to have the cluster etch tool ready for operation in October 2019.

I am looking forward to the various presentations and to meet you personally at the workshop.

Julian Hartbaum