Partner for Advanced Nanopatterning

19th Workshop Beams & More

Program

CET Duration Title Author
09 : 30 00 : 05 Welcome Joachim Burghartz – IMS CHIPS Stuttgart, Germany
09 : 35 00 : 15 IMS CHIPS Update 2022 Julian Hartbaum – IMS CHIPS Stuttgart, Germany
09 : 50 00 : 20 High-NA EUV Ante Portas: Status and Future Developments Timon Mehrling – Carl Zeiss SMT GmbH Oberkochen, Germany
10 : 10 00 : 20 New Data Prep Solutions for the Exposure of Non-Manhattan Structures with Vistec VSB E-Beam Writers Eike Linn – Vistec Electron Beam GmbH Jena, Germany
10 : 30 00 : 20 tbd Sebastian Lekart – IMS Nanofabrication GmbH Brunn am Gebirge, Austria
10 : 50 00 : 30 Coffee break  
11 : 20 00 : 20 Step & Repeat – a Solution for Wafer Scale Mastering Patrick Schuster – EV Group St. Florian am Inn, Austria
11 : 40 00 : 20 Opportunities and Risks for Metalenses in Mass Production Chen Li- ams International AG Rüschlikon, Switzerland
12 : 00 00 : 20 tbd Anja Voigt- micro resist technology GmbH Berlin, Germany
12 : 20 00 : 20 In-situ material replacement for efficient high-resolution multi-material 3D laser printing Robert Kirchner – TU Dresden Dresden, Germany
12 : 40 01 : 30 Lunch  
14 : 10 00 : 20 tbd Mathias Kaschel – IMS CHIPS Stuttgart, Germany
14 : 30 00 : 20 Process correction for laser direct and mask writing for photonic devices Dmitri Titko -GenISys GmbH Taufkirchen, Germany
14 : 50 00 : 20 Quantum sensors – from science to business Robert Rölver -Q.ANT GmbH Stuttgart, Germany
15 : 10 00 : 20 tbd Philipp Dietrich – Vanguard Automation GmbH Karlsruhe, Germany
15 : 30 00 : 30 Coffee break  
16 : 00 00 : 20 tbd Alexander Klasen – Park Systems Europe GmbH Mannheim, Germany
16 : 20 00 : 30 Challenges of Analog Visual Cryptography: a history of the domino problem Michael Winter – Musician/Artist Berlin, Germany
16 : 50 00 : 10 Closing remarks Julian Hartbaum – IMS CHIPS Stuttgart, Germany
       
18 : 30   Joint Dinner Waldhotel Relexa Stuttgart, Germany