Partner for Advanced Nanopatterning

19th Workshop Beams & More

17.11.2022

Program

CET Duration Title Author
09 : 30 00 : 05 Welcome Joachim Burghartz – IMS CHIPS, Stuttgart, Germany
09 : 35 00 : 15 IMS CHIPS Update 2022 Julian Hartbaum – IMS CHIPS, Stuttgart, Germany
09 : 50 00 : 20 High-NA EUV Ante Portas: Status and Future Developments Timon Mehrling – Carl Zeiss SMT GmbH, Oberkochen, Germany
10 : 10 00 : 20 New Data Prep Solutions for the Exposure of Non-Manhattan Structures with Vistec VSB E-Beam Writers Eike Linn – Vistec Electron Beam GmbH, Jena, Germany
10 : 30 00 : 20 The future of MBMW multi-beam mask writers Sebastian Lekart – IMS Nanofabrication GmbH, Brunn am Gebirge, Austria
10 : 50 00 : 30 Coffee break  
11 : 20 00 : 20 Step & Repeat – a Solution for Wafer Scale Mastering Patrick Schuster – EV Group, St. Florian am Inn, Austria
11 : 40 00 : 20 Opportunities and Risks for Metalenses in Mass Production Chen Li – ams International AG, Rüschlikon, Switzerland
12 : 00 00 : 20 Functional Materials for life science applications – Microfluidics and more Mirko Lohse – micro resist technology GmbH, Berlin, Germany
12 : 20 00 : 20 In-situ material replacement for efficient high-resolution multi-material 3D laser printing Robert Kirchner – TU Dresden, Dresden, Germany
12 : 40 01 : 30 Lunch IMS CHIPS, Stuttgart
14 : 10 00 : 20 Silicon Photonics for Quantum applications Mathias Kaschel – IMS CHIPS, Stuttgart, Germany
14 : 30 00 : 20 Process correction for laser direct and mask writing for photonic devices Dmitri Titko – GenISys GmbH, Taufkirchen, Germany
14 : 50 00 : 20 Quantum sensors – from science to business Robert Rölver – Q.ANT GmbH, Stuttgart, Germany
15 : 10 00 : 20 Scalable Photonic Packaging Solutions using Photonic Wire Bonding (PWB) and Micro Lenses Philipp Dietrich – Vanguard Automation GmbH, Karlsruhe, Germany
15 : 30 00 : 30 Coffee break  
16 : 00 00 : 20 „The Swiss Army Knife“ of Microscopy: Atomic Force Microscopy as a Versatile Tool to Image Correlative Properties on a Nanometer Range Alexander Klasen – Park Systems Europe GmbH, Mannheim, Germany
16 : 20 00 : 20 Flexible approach for the production slanted surface relief gratings by ion beam etching Mandy Göring – scia Systems GmbH, Chemnitz, Germany
16 : 40 00 : 30 Challenges of Analog Visual Cryptography: a history of the domino problem Michael Winter – Musician/Artist, Berlin, Germany
17 : 10 00 : 10 Closing remarks Julian Hartbaum – IMS CHIPS, Stuttgart, Germany
       
18 : 30   Joint Dinner Waldhotel Relexa, Stuttgart, Germany