19th Workshop Beams & More

CET	Duration	Title	Author
09 : 30	00 : 05	Welcome	Joachim Burghartz – IMS CHIPS, Stuttgart, Germany
09 : 35	00 : 15	IMS CHIPS Update 2022	Julian Hartbaum – IMS CHIPS, Stuttgart, Germany
09 : 50	00 : 20	High-NA EUV Ante Portas: Status and Future Developments	Timon Mehrling – Carl Zeiss SMT GmbH, Oberkochen, Germany
10 : 10	00 : 20	New Data Prep Solutions for the Exposure of Non-Manhattan Structures with Vistec VSB E-Beam Writers	Eike Linn – Vistec Electron Beam GmbH, Jena, Germany
10 : 30	00 : 20	The future of MBMW multi-beam mask writers	Sebastian Lekart – IMS Nanofabrication GmbH, Brunn am Gebirge, Austria
10 : 50	00 : 30	Coffee break
11 : 20	00 : 20	Step & Repeat – a Solution for Wafer Scale Mastering	Patrick Schuster – EV Group, St. Florian am Inn, Austria
11 : 40	00 : 20	Opportunities and Risks for Metalenses in Mass Production	Chen Li – ams International AG, Rüschlikon, Switzerland
12 : 00	00 : 20	Functional Materials for life science applications – Microfluidics and more	Mirko Lohse – micro resist technology GmbH, Berlin, Germany
12 : 20	00 : 20	In-situ material replacement for efficient high-resolution multi-material 3D laser printing	Robert Kirchner – TU Dresden, Dresden, Germany
12 : 40	01 : 30	Lunch	IMS CHIPS, Stuttgart
14 : 10	00 : 20	Silicon Photonics for Quantum applications	Mathias Kaschel – IMS CHIPS, Stuttgart, Germany
14 : 30	00 : 20	Process correction for laser direct and mask writing for photonic devices	Dmitri Titko – GenISys GmbH, Taufkirchen, Germany
14 : 50	00 : 20	Quantum sensors – from science to business	Robert Rölver – Q.ANT GmbH, Stuttgart, Germany
15 : 10	00 : 20	Scalable Photonic Packaging Solutions using Photonic Wire Bonding (PWB) and Micro Lenses	Philipp Dietrich – Vanguard Automation GmbH, Karlsruhe, Germany
15 : 30	00 : 30	Coffee break
16 : 00	00 : 20	„The Swiss Army Knife“ of Microscopy: Atomic Force Microscopy as a Versatile Tool to Image Correlative Properties on a Nanometer Range	Alexander Klasen – Park Systems Europe GmbH, Mannheim, Germany
16 : 20	00 : 20	Flexible approach for the production slanted surface relief gratings by ion beam etching	Mandy Göring – scia Systems GmbH, Chemnitz, Germany
16 : 40	00 : 30	Challenges of Analog Visual Cryptography: a history of the domino problem	Michael Winter – Musician/Artist, Berlin, Germany
17 : 10	00 : 10	Closing remarks	Julian Hartbaum – IMS CHIPS, Stuttgart, Germany
18 : 30		Joint Dinner	Waldhotel Relexa, Stuttgart, Germany