Home2025-Program

IMS CHIPS
Partner for Advanced Nanopatterning

Beams & More

22nd Workshop

November 13th, 2025 • Stuttgart, Germany

Preliminary Program

Programm-Highlights
  • E-beam & Laser Patterning
  • Photonic Processes & Devices
  • EUV & Nanoimprint Lithography
  • Micro-Optics & Micromechanics

Welcome to the Beams & More workshop!

Enjoy the inspiring atmosphere of this one-day event and take part in some mutually beneficial exchanges.

The participation fee of € 290 includes lunch and dinner. A link to the online stream will be made available to all registrants in case attendance at the workshop is not possible.

Please register using the ‚Registration‘ button on this website.

I look forward to meeting you in person at the workshop.

Sincerely,
Julian Hartbaum

Registration

Program

9:30
00:05
Welcome

Niels Quack  / IMS CHIPS
Stuttgart, Germany

9:35
00:15
IMS CHIPS Update 2025

Julian Hartbaum  / IMS CHIPS
Stuttgart, Germany

9:50
00:20
The future is bright – Update and outlook on EUV lithography

Sandro Hoffmann / Carl Zeiss SMT GmbH
Oberkochen, Germany

10:10
00:20
Status and Perspectives of Nanoimprint Lithography –
The Scalable Path to Advanced Patterning

Patrick Schuster / EV Group
St. Florian am Inn, Austria

10:30
00:20
From Cleanroom to Greenroom

Martin Zimmermann / IMS CHIPS
Stuttgart, Germany

10:50
00:30
Coffee break

11:20
00:20
Integrated Photonics at IMS CHIPS

Mathias Kaschel / IMS CHIPS
Stuttgart, Germany

11:40
00:20
Resonant confinment in air: Mie voids for environmental nanophotonics, metasurfaces, and UV photonics

Mario Hentschel / University Stuttgart, 4th Physics Institute
Stuttgart, Germany

12:00
00:20
Ion Beam Figuring: New Applications and Developments for Quantum Technologies

David Schäfer / NTG Neue Technologien GmbH & Co.KG
Gelnhausen, Germany

12:20
00:20
Improved e-Beam Cell Projection through automated CP detection and positioning

Thomas Michels / GenISys GmbH
Unterhaching, Germany

12:45
01:00
Lunch

IMS CHIPS lounge area

13:45
00:30
IMS Tour

Start @ IMS lounge area

14:30
00:20
Update on latest photoresist innovations

Anja Voigt / micro resist technology GmbH
Berlin, Germany

14:50
00:20
Accuracy on a large scale

Peter Speckbacher / Dr. Johannes Heidenhain GmbH
Traunreut, Germany

15:10
00:20
Mix & Match: Direct Write Lithography for Flexible Multi-Scale Foundry Solutions

Florian Döring / XRnanotech AG
Villigen, Switzerland

15:30
00:20
Stencil Lithography for High-Performance Flexible Organic Thin-Film Transistors

Hagen Klauk / Max Planck Institute for Solid State Research
Stuttgart, Germany

15:50
00:30
Coffee break

16:20
00:20
Advancing Electron Beam Lithography with the HSQ Resist Medusa 84 SiH

Harry Biller / Allresist GmbH
Strausberg, Germany

16:40
00:20
MLA 150 and MLA 300 - Maskless Aligner Platform for Applications in R&D and Industry

Benedikt Stender / Heidelberg Instruments Mikrotechnik GmbH
Heidelberg, Germany

17:00
00:20
AI assisted Inspection & Metrology by Light Microscopes

Hartmut Feuerbacher / Promicron GmbH
Kirchheim, Germany

17:20
00:05
concluding remarks

Julian Hartbaum / IMS CHIPS
Stuttgart, Germany

18:30
Joint Dinner

Waldhotel Relexa / Stuttgart, Germany

About the Workshop

A one-day forum featuring presentations from industry and research partners on micro- and nanostructuring – with excellent networking opportunities.

Location

HLRS, Nobelstr. 19, 70569 Stuttgart, Germany

Participation

In-person event, including lunch and dinner