Home2025

IMS CHIPS
Partner for Advanced Nanopatterning

Beams & More

22nd Workshop

November 13th, 2025 • Stuttgart, Germany

Preliminary Program

Programm-Highlights
  • E-beam & Laser Patterning
  • Photonic Processes & Devices
  • EUV & Nanoimprint Lithography
  • Micro-Optics & Micromechanics

Welcome to the Beams & More workshop!

Enjoy the inspiring atmosphere of this one-day event and take part in some mutually beneficial exchanges.

The participation fee of € 290 includes lunch and dinner. A link to the online stream will be made available to all registrants in case attendance at the workshop is not possible.

Please register using the ‚Registration‘ button on this website.

I look forward to meeting you in person at the workshop.

Sincerely,
Julian Hartbaum

Registration

Preliminary Program

The future is bright – Update and outlook on EUV lithography

Sandro Hoffmann
Carl Zeiss SMT GmbH
Oberkochen, Germany

Ion Beam Figuring: New Applications and Developments for Quantum Technologies

David Schäfer
NTG Neue Technologien GmbH & Co.KG
Gelnhausen, Germany

Accuracy on a large scale

Peter Speckbacher
Dr. Johannes Heidenhain GmbH
Traunreut, Germany

Resonant confinment in air: Mie voids for environmental nanophotonics, metasurfaces, and UV photonics

Mario Hentschel
University Stuttgart, 4th Physics Institute
Stuttgart, Germany

Update on latest photoresist innovations

Anja Voigt
micro resist technology GmbH
Berlin, Germany

Status and Perspectives of Nanoimprint Lithography –
The Scalable Path to Advanced Patterning

Patrick Schuster
EV Group
St. Florian am Inn, Austria

Stencil Lithography for High-Performance Flexible Organic Thin-Film Transistors

Hagen Klauk
Max Planck Institute for Solid State Research
Stuttgart, Germany

Advancing Electron Beam Lithography with the HSQ Resist Medusa 84 SiH

Harry Biller
Allresist GmbH
Strausberg, Germany

Integrated Photonics at IMS CHIPS

Mathias Kaschel
IMS CHIPS
Stuttgart, Germany

From Cleanroom to Greenroom
Martin Zimmermann
IMS CHIPS Stuttgart, Germany
AI assisted Inspection & Metrology by Light Microscopes

Hartmut Feuerbacher
Promicron GmbH
Kirchheim, Germany

Improved e-Beam Cell Projection through automated CP detection and positioning
Thomas Michels
GenISys GmbH Unterhaching, Germany
tbd
Benedikt Stender
Heidelberg Instruments Mikrotechnik GmbH Heidelberg, Germany
tbd

Florian Döring
XRnanotech AG
Villigen, Switzerland

About the Workshop

A one-day forum featuring presentations from industry and research partners on micro- and nanostructuring – with excellent networking opportunities.

Location

HLRS, Nobelstr. 19, 70569 Stuttgart, Germany

Participation

In-person event, including lunch and dinner