21st Workshop Beams & More
28.11.2024

Partner for Advanced Nanopatterning
IMS CHIPS Stuttgart, Germany

Welcome to our Beams & More workshop!

We are delighted to be organising the 21st workshop after the first one in 2003. As in previous years, our partners and customers will be sharing their insights and experiences in presentations at the heart of the event.

You are cordially invited to attend the workshop, where you will have the opportunity to engage in a mutually beneficial exchange and enjoy the inspiring atmosphere of this one-day event.

The participation fee of € 280 includes lunch and dinner. An online link will be made available to all registrants, so that the presentations can be followed in case attendance at the workshop is not possible.

Please register by using the „Registration“ button on this website.

I am looking forward to meeting you in person at the workshop.

Sincerely,
Julian Hartbaum

Program

09:30 (00:05)

Jens Anders

IMS CHIPS
Stuttgart, Germany

Welcome

09:35 (00:15)

IMS CHIPS
Stuttgart, Germany

IMS CHIPS Update 2024

09:50 (00:20)

ASML
Veldhoven, The Netherlands

The next step in Moore’s Law: High NA EUV is here

10:10 (00:20)

Carl Zeiss SMT GmbH
Oberkochen, Germany

High-NA EUV – breakthrough in resolution and precision

10:30 (00:20)

IMS-Produkte GmbH
Stuttgart, Germany

IMS GmbH - Strengthening the IMS industry business over the next years

10:50 (00:30)

11:20 (00:20)

Astrit Shoshi

IMS CHIPS
Stuttgart, Germany

Mastering the master

11:40 (00:20)

EV Group
St. Florian am Inn, Austria

Synchronization of Process and Material to Achieve Best Results in Nanoimprinting Lithography

12:00 (00:20)

AIT
Vienna, Austria

Nanoimprint lithography for the fabrication of multifunctional nanoparticles for biomedical applications

12:20 (00:20)

IMS Nanofabrication GmbH
Brunn am Gebirge, Austria

tbd

14:30 (00:20)

IMS CHIPS
Stuttgart, Germany

Integrated Photonics at IMS

14:50 (00:20)

Vistec Electron Beam GmbH
Jena, Germany

How can Variable Shaped Beam lithography be tuned for photonic and optics applications?

15:10 (00:20)

micro resist technology GmbH
Berlin, Germany

Innovative Photopolymers Advancing Micro- and Nano Patterning for Photonic Applications

15:30 (00:20)

Fraunhofer IOF
Jena, Germany

Advancements in nano-photonics: From PICs to waveguides to spectrometer gratings

15:50 (00:30)

16:20 (00:20)

Q.ANT GmbH
Stuttgart, Germany

Quantum sensors for native human machine interfaces

16:40 (00:20)

Fraunhofer ENAS
Chemnitz, Germany

2.5D grayscale and intra level mix and match lithography by electron beam and i-line stepper lithography processes

17:00 (00:20)

Bruker
Karlsruhe, Germany

Multi Modal Optical Metrology for High Resolution Refractive Index and Film Thickness Measurements

17:20 (00:05)

IMS CHIPS
Stuttgart, Germany

Closing remarks

18:30 

Waldhotel Relexa, Stuttgart, Germany