Home2025-Program-closed

IMS CHIPS
Partner for Advanced Nanopatterning

Beams & More

22nd Workshop

November 13th, 2025 • Stuttgart, Germany

Program

Programm-Highlights
  • E-beam & Laser Patterning
  • Photonic Processes & Devices
  • EUV & Nanoimprint Lithography
  • Micro-Optics & Micromechanics

Welcome to the Beams & More workshop!

Enjoy the inspiring atmosphere of this one-day event and take part in some mutually beneficial exchanges.

The participation fee of € 290 includes lunch and dinner. A link to the online stream will be made available to all registrants in case attendance at the workshop is not possible.

Please register using the ‚Registration‘ button on this website.

I look forward to meeting you in person at the workshop.

Sincerely,
Julian Hartbaum

Dear colleagues,

We would like to inform you that registration for our workshop is unfortunately already closed.

Thank you for your interest! We hope to welcome you at future events.

Program

9:30
00:15
Welcome

Niels Quack  / IMS CHIPS
Stuttgart, Germany

9:45
00:05
Beams & More 2025

Julian Hartbaum  / IMS CHIPS
Stuttgart, Germany

9:50
00:20
The future is bright – Update and outlook on EUV lithography

Sandro Hoffmann / Carl Zeiss SMT GmbH
Oberkochen, Germany

10:10
00:20
Status and Perspectives of Nanoimprint Lithography –
The Scalable Path to Advanced Patterning

Patrick Schuster / EV Group
St. Florian am Inn, Austria

10:30
00:20
From Cleanroom to Greenroom

Martin Zimmermann / IMS CHIPS
Stuttgart, Germany

10:50
00:30
Coffee break

11:20
00:20
Integrated Photonics at IMS CHIPS

Mathias Kaschel / IMS CHIPS
Stuttgart, Germany

11:40
00:20
Resonant confinment in air: Mie voids for environmental nanophotonics, metasurfaces, and UV photonics

Mario Hentschel / University Stuttgart, 4th Physics Institute
Stuttgart, Germany

12:00
00:20
Ion Beam Figuring: New Applications and Developments for Quantum Technologies

David Schäfer / NTG Neue Technologien GmbH & Co.KG
Gelnhausen, Germany

12:20
00:20
Improved e-Beam Cell Projection through automated CP detection and positioning

Ulrich Hofmann / GenISys GmbH
Unterhaching, Germany

12:45
01:00
Lunch

IMS CHIPS lounge area

13:45
00:30
IMS Tour

Start @ IMS lounge area

14:30
00:20
Update on latest photoresist innovations

Anja Voigt / micro resist technology GmbH
Berlin, Germany

14:50
00:20
Accuracy on a large scale

Peter Speckbacher / Dr. Johannes Heidenhain GmbH
Traunreut, Germany

15:10
00:20
Mix & Match: Direct Write Lithography for Flexible Multi-Scale Foundry Solutions

Florian Döring / XRnanotech AG
Villigen, Switzerland

15:30
00:20
Stencil Lithography for High-Performance Flexible Organic Thin-Film Transistors

Hagen Klauk / Max Planck Institute for Solid State Research
Stuttgart, Germany

15:50
00:30
Coffee break

16:20
00:20
Advancing Electron Beam Lithography with the HSQ Resist Medusa 84 SiH

Harry Biller / Allresist GmbH
Strausberg, Germany

16:40
00:20
MLA 150 and MLA 300 - Maskless Aligner Platform for Applications in R&D and Industry

Benedikt Stender / Heidelberg Instruments Mikrotechnik GmbH
Heidelberg, Germany

17:00
00:20
AI assisted Inspection & Metrology by Light Microscopes

Hartmut Feuerbacher / Promicron GmbH
Kirchheim, Germany

17:20
00:05
concluding remarks

Julian Hartbaum / IMS CHIPS
Stuttgart, Germany

18:30
Joint Dinner

Waldhotel Relexa / Stuttgart, Germany

About the Workshop

A one-day forum featuring presentations from industry and research partners on micro- and nanostructuring – with excellent networking opportunities.

Location

HLRS, Nobelstr. 19, 70569 Stuttgart, Germany

Participation

In-person event, including lunch and dinner